Abstract
The parameters that control the thickness distribution of thin films produced by pulsed laser deposition are investigated. It is found that highly asymmetric material distribution profiles can be obtained in vacuum when high energy densities are used and the target surface is positioned at the lens focus. The asymmetries are due to asymmetries in the spatial distribution of the beam. Under Ar gas pressure, the profile becomes symmetric and the distribution narrows as a consequence of collisions between the ejected species and the gas. In vacuum, decreasing the energy density, by decreasing the laser energy output or by moving the lens to defocus the beam, leads to symmetric distribution profiles. Nevertheless, in the first case a quite broad distribution and a low deposition rate are obtained, whereas in the second case the distribution is narrow and the deposition rate increases.
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