Abstract
AbstractThe principle of the technique of crater edge profiling is described as an alternative method to conventional sputter profiling. The predictions for the lateral composition profile assuming a Gaussian intensity distribution of the primary ion beam are tested for a multilayer sandwich structure of Ni/Cr layers of 11.5 nm single layer thicknesses after Ar+ ion sputtering through 20 layers and scanning Auger microscopy with a 10 µm diameter electron beam. Due to the small angle of 44.3″ of the slope of the crater formed by ion sputtering, a magnification factor (lateral variation/depth variation) of 5 × 103 is obtained.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
