Cr(NO3)3 as a New Etching Reagent for an Al-Based Metal–Organic Framework to Control Its Crystal Size and Defects

Yohei Takashima, Takaaki Tsuruoka + Show 3 more

https://doi.org/10.1021/acs.cgd.3c01405

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Publication Date: Feb 6, 2024

Abstract

Cr(NO<sub>3</sub>)<sub>3</sub> as a New Etching Reagent for an Al-Based Metal–Organic Framework to Control Its Crystal Size and Defects

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