Coverage‐Dependent Variation of Adsorption Configurations of Methionine on Ge(100)

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The adsorption configurations of methionine molecules on the Ge(100) surface have been studied by using DFT calculations, core-level photoemission spectroscopy (CLPES), and low-energy electron diffraction (LEED) to scrutinize the adsorption structure as a function of coverage. At first, we obtained two important and stable structures. One is the most stable structure between these structures described as an "O-H dissociated-N dative-S dative-bonded structure" and the other is a less stable adsorption structure of these indicating an "O-H dissociated-S dative-bonded structure" by using DFT calculations. We also performed CLPES to clarify our DFT calculation results. Through the spectral analysis of the S 2p, C 1s, N 1s, and O 1s core-level spectra, we acquired the reasonable results that also revealed quite different bonding configurations depending on the methionine coverage. At low coverage (ca. 0.30 ML), a single type of sulfur and charged nitrogen peaks, which indicate an "O-H dissociated-N dative-S dative-bonded structure", were observed. On the other hand, two types of sulfur peaks with thiol formation and two nitrogen peaks with neutralized and charged characteristics were monitored at a higher coverage (0.60 ML and above), which can be described as an "O-H dissociated-S dative-bonded structure". Hence, we can clearly demonstrate that our results obtained from CLPES spectra and DFT calculations are matched well with each other. Moreover, we additionally confirmed that the relative population of the two types of thiols and amines being included in methionine in between half monolayer induces a surface reorientation in the ordering from 2×1 to 1×1 employing LEED. This interesting variation of the methionine adsorbed on the Ge(100) surface by coverage dependence will be precisely discussed by using DFT calculations, CLPES, and LEED.