Abstract
AbstractOn p. 2593, Ji and co‐workers report on a novel fabrication technique for ideally ordered lateral nanowire and nanoring arrays based on interference lithography and electrochemical deposition. This approach allows the fabrication of metallic and semiconductor nanowire or nanoring arrays over wafer‐scale areas and provides flexible control over shape, arrangement, and thickness of the nanowires and nanorings. The cover shows templated electrodeposited elliptical nanoring arrays and a cross‐section of electrodeposited nanowires.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callSimilar Papers
More From: Advanced Materials
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
