Abstract
Cationic and anionic polymers provide negative resists for electron beam lithography. These patterned polymer features can then be employed as templates for electrostatic self-assembly of magnetic, metallic, or semiconducting nanoparticles, or for electroless deposition of metals. This synergistic integration of bottom-up and top-down methodologies, reported by Vincent Rotello and co-workers on p. 2561 combines the versatility and modularity of self-assembly processes and the proven capabilities of lithographic techniques.
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