Abstract
On p. 3524 A. Dabirian, P. Hoffmann et al. report on the discovery of chemical vapor deposition (CVD) conditions where both the precursor adsorption and the chemical reaction limit the process. Operating CVD under these conditions has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments.
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