Corrosion Resistance Behavior of Single-Layer Cathodic Arc PVD Nitride-Base Coatings in 1M HCl and 3.5 pct NaCl Solutions

Abstract

The electrochemical behavior of single-layer TiN, CrN, CrAlN, and TiAlN coatings on 304 stainless steel substrate, deposited using state-of-the-art and industrial size cathodic arc PVD machine, were evaluated in 1M HCl and 3.5 pct NaCl solutions. The corrosion behavior of the blank and coated substrates was analyzed by electrochemical impedance spectroscopy (EIS), linear polarization resistance, and potentiodynamic polarization. Bond-coat layers of pure-Ti, pure-Cr, alloyed-CrAl, and alloyed-TiAl for TiN, CrN, CrAlN, and TiAlN coatings were, respectively, first deposited for improved coating adhesion before the actual coating. The average coating thickness was about 1.80 µm. Results showed that the corrosion potentials (Ecorr) of the coated substrates were shifted to more noble values which indicated improvement of the coated substrate resistance to corrosion susceptibility. The corrosion current densities were lower for all coated substrates as compared to the blank substrate. Similarly, EIS parameters showed that these coatings possessed improved resistance to defects and pores in similar solution compared to the same nitride coatings developed by magnetron sputtering. The charge transfer resistance (Rct) can be ranked in the following order: TiAlN > CrN > TiN > CrAlN in both media except in NaCl solution where Rct of TiN is lowest. While the pore resistance (Rpo) followed the order: CrAlN > CrN > TiAlN > TiN in HCl solution and TiAlN > CrN > CrAlN > TiN in NaCl solution. It is found that TiAlN coating has the highest protective efficiencies of 79 and 99 pct in 1M HCl and 3.5 pct NaCl, respectively. SEM analysis of the corroded substrates in both media was also presented.