Abstract
Three sets of ZrNx films with varied N vacancy concentration (VN) were sputter-deposited onto 304 stainless steel sheets and Si substrates by physical vapor deposition. The thin films were characterized using scanning electron microscope, glancing angle X-ray diffraction and X-ray photoelectron spectroscopy. Their corrosion inhibition behaviors were studied by the potentiodynamic measurements and electrochemical impedance spectroscopy in 3.5 wt% NaCl solution. The experimental results indicated that the corrosion inhibition efficiency was relevant to VN. The samples with VN near 0.3 had the best corrosion inhibition efficiency. The quantum chemical parameters (EHOMO, ELUMO) were also calculated to evaluate the corrosion inhibition efficiency. The overall results showed that corrosion inhibition efficiency of ZrNx film was correlated to N vacancy concentration.
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