Abstract
The interaction of thin Ti–B–N films obtained by magnetron reactive sputtering of a TiB2 target was studied in an atmosphere of a gas argon–nitrogen mixture (85 vol % Ar + 15 vol % N2), with mineral acids (HCl, H2SO4, H3PO4, HNO3). It was found that the hexagonal boron nitride formed during the deposition process, along with titanium nitride, forms a resistant protective film that protects the bulk (~85%) of the film from corrosion.
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