Abstract
W/WOx multilayered thin films have been deposited by DC reactive sputtering using the reactive gas pulsing process. It is implemented to produce regular alternations of metal-oxide compounds at the nanometric scale. Structure and growth have been investigated by high resolution transmission electron microscopy, scanning transmission electron microscopy, X-ray energy dispersive spectroscopy and electron energy loss spectroscopy. Regularity of tungsten-based alternations, quality of interfaces as well as oxygen presence through the multilayered structure have been determined and linked to the growth conditions. Chemical information was obtained from the energy dispersive X-ray spectroscopy and low-loss electron energy loss spectroscopy. As they can be related to the chemical composition of the periodic layers, the position and the broadening of the bulk plasmon peak were studied. For the smallest periods (<10 nm), the presence of oxygen has been pointed out in the metal-rich layer whereas for the thickest ones (100 nm), pure metal is only present. Finally, relationships have been established between in situ growth conditions, structural and chemical parameters and electrical properties in periodic multilayers.
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