Abstract
Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2O5 target at the laser fluence of 2 J cm−2. The substrate temperature and the target-substrate distance were set to 500 ∘C and 4 cm, respectively. X-ray diffraction analysis showed that pure VO2 is only obtained at an oxygen pressure range of 4×10−3–2×10−2 mbar. A higher optical switching contrast was obtained for the VO2 films deposited at 4×10−3–10−2 mbar. The films properties were correlated to the plume-oxygen gas interaction monitored by fast imaging of the plume.
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