Abstract

The single-collector contact efficiency (η0) for physicochemical colloid filtration under horizontal flow in saturated porous media was calculated using trajectory analysis in three dimensions. Past studies have developed correlation equations for colloids with densities close to that of water, such as bacteria and latex particles. A new correlation equation was developed for predicting η0 based on a large number of trajectory simulations to account for higher-density particles representative of metal colloids. The correlation equation was developed by assuming Brownian diffusion, interception, and gravitational sedimentation contributed to η0 in an additive manner. Numerical simulations for colloid trajectory analysis used for calculating η0 were based on horizontal flow around a collector under the action of van der Waals attractive forces, gravity, and hydrodynamic forces as well as Brownian motion. The derived correlation equation shows excellent agreement with existing correlation equations for particles with density close to that of water. However, the correlation equation presented in this study shows that η0 of high-density colloids, such as metal particles, transported under horizontal flow deviates from that predicted by existing correlations for colloids larger than 4 μm and under low approach velocities. Simulations of trajectory paths show that a significantly reduced contact of high-density colloids larger than 4 μm in size with a collector is due to gravity forces causing trajectory paths to deviate away from the underside of collectors. The new correlation equation is suitable for predicting the single collector efficiency of large particles (several hundred nanometers to several micrometers) and with a large amount of density transport in the horizontal flow mode but is unsuitable for particles with a quite small size (several to tens of nanometers) and for the particle with a large amount of density flow in the vertical flow mode. The trajectory analysis was conducted for particles under favorable deposition conditions.

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