Abstract
Carbon nitride films deposited by ArF excimer laser ablation of a graphite target in the 1–100-Pa N2 pressure and 1.0–10-J cm−2 fluence domains differ not only in their nitrogen but also in their oxygen content. The (surface) oxygen content correlates well with the compactness of the films. Oxygen contents below approximately 8 at.%, smooth surface, and mass densities above 2.2 g cm−3 are typical of films deposited at low N2 pressures (and high fluences) while deposition at/above 50 Pa results in films of oxygen contents exceeding 12 at.%, rough surface consisting of loosely connected cluster agglomerates, and density values at approximately 1.4 g cm−3. At medium pressures high fluence processing is advantageous in terms of both nitrogen content and film morphology.
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