Abstract
Silicon nanocrystallites produced by low temperature plasma-enhanced chemical vapor deposition (PECVD) technique have shown size-dependent photoluminescent (PL) response. Crystalline volume fraction was characterized by Roman spectroscopy. The average grain sizes of crystallizes were estimated by using x-ray diffraction. The structural chemical properties of poly-Si films with nanocrystallites were studied by means of Fourier transform infrared spectroscopy. Furthermore, the surface morphology of the films was investigated by means of atomic force microscopy. There is a strong correlation between size distribution of nanocrystallites and PL characteristics such as PL peak energy, integrated PL Intensity and FWHM of PL spectra. Also, the luminescent properties of nanocrystallites depend on hydrogen termination of their surface. We deposited the polycrystalline silicon (poly-Si) films with controlled size distribution of hydrogenated nanocrystals and sufficient luminescent properties.
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