Abstract
This paper deals with the properties of micromagnetic films for planar inductors with a magnetic core, and with a production process that does not damage the magnetic properties. Micro-rectangular-multilayer (CoFe)x (SiB)1-x/SiO2 (x=0.82-0.90) films 300μm wide and 2 mm long were prepared by an RF-magnetron sputtering method. The frequency dependence of the complex permeability (μ' and μ'') of films was measured by using the parallel line method. The inverse loss tangent (1/tan δ) values of multilayer films were calculated from the value of μ'/μ'' at 400 MHz. The values of μ' × (1/tan δ) of multilayer films increased to a maximum of 6500 at x=0.86. Planar inductors with a multilayer film core were fabricated by using an RF sputtering method and a lift-off technique. The highest value of the maximum value of the quality factor (Qmax) of inductors is obtained by using a multilayer film of x=0.86. The present results emphasize that a higher value of μ' × (1/tan δ) and a higher flatness of the insulation layer under the magnetic core are important factors for increasing the quality factor of micro-planar devices with a magnetic core.
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