Abstract
In this work, chromium thin films were deposited using dcMS and HiPIMS technologies. To compare these technologies, we analyzed the ion flux and the Cr coating microstructure in the same plasma conditions. Ion flux was measured with a mass spectrometer in time-averaged for both discharge and time-resolved for HiPIMS discharge. Time-averaged measurements provided important information. First, the low energetic part of the ion energy distribution function (IEDF) was similar in dcMS and HiPIMS and second the high energetic component was more prominent in the HiPIMS discharge. Time-resolved measurements showed that the high energetic part of the ion flux reached the mass spectrometer faster than the lowest part. It is only after the pulse end that most of the thermalized ions arrived and then cooled the flux. The correlation of these results with microstructure analysis shows that energetic particles induced a higher film density and a smoother surface in HiPIMS compared to dcMS discharge.
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