Abstract
A special wake-up effect from antiferroelectric-like to ferroelectric (AFE-FE) characteristics in HfxZr1−xO2 thin films has been discussed intensively in terms of endurance performance enhancement. However, its physical origin and general impact on endurance remain unclear. In this work, the influence of various process parameters on the AFE-FE wake-up effect as well as on endurance performance and the material changes during AFE-FE wake-up are systematically studied. It is found that various parameters induce the AFE-FE wake-up effect and enhance endurance performance in the same way with enhancing tetragonal phase formation in HfxZr1−xO2 films, and the cycles of wake-up are universally associated with those of total endurance. In addition, via synchrotron-based grazing incidence x-ray diffraction, a tetragonal-orthorhombic-monoclinic phase transition is observed during AFE-FE wake-up. On the basis of these results, a correlation among crystalline composition, the AFE-FE wake-up effect, and the endurance performance of HfxZr1−xO2 thin films is established. This provides a clear guideline to a viable solution for the high endurance of HfxZr1−xO2 FE memory devices via crystal phase engineering.
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