Abstract
ZnO thin films were deposited by RF magnetron sputtering using commercial sintered and in-house made powder targets. The structural, optical, chemical composition and surface morphology of the ZnO thin films were characterized by X-ray diffraction (XRD), Atomic Force Microscopy (AFM), Field Emission Scanning Electron Microscopy (FESEM), X-ray Photoelectron Spectroscopy (XPS), UV–Visible spectroscopy, Photoluminescence (PL) and Raman Spectroscopy. XRD data established that both films were c-axis oriented and the appearance of E2H mode in Raman spectra confirmed the hexagonal wurtzite structure of the films. AFM micrographs revealed the homogeneity and nanocrystalline nature of the films. XPS and EDX studies confirmed that the films contained only Zn and O elements. Both the films showed superior optical properties and > 90% transmittance in the visible region. The results conclude that powder targets can be used to achieve complex/mixed metal oxide films having optical/electronic quality thereby overcoming the limitation of choice as in the case of commercial targets.
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