Correction of different spatial frequency errors of large and thin optical windows based on ion beam figuring

Abstract

The large and thin plane optical windows are used in large high power laser devices. Typically conventional methods such as stressed-lap polishing and small-tool pitch polishing are used to manufacture these optics. Nevertheless, the required wavefront accuracy cannot be achieved by the last smal-tool pitch polishing process which can lead to middle spatial frequency errors and high-slope errors because of the edge effect , unstable removal rate and pressure -loaded deformation. Ion Beam Figuring (IBF) technology is an optical fabrication method which can highly correct different spatial frequency errors due to the highly deterministic, highly stable, very small tools and noncontact. In this paper, IBF was employed to correct different spatial frequency errors of a large and thin plane optical windows. Before IBF, transmission wavefront error of the substrate was 0.51λ PV, 32.3nm/cm GRMS, 2.91nm PSD1, 0.27nm PSD2, 0.38nm Rq after being polished by double-sided polishing machine, and was improved to 0.07λ PV, 2.1nm/cm GRMS, 1.76nm PSD1, 0.13nmPSD2, 0.33nmRq after only two IBF(about thirty six hours processing time). All spatial frequency errors reached the required values.