Abstract
To investigate the effect of the substrate surface roughness on the magnetic properties of Co1−XPtX alloy films (X\fallingdotseq0.73), the alloy films were prepared on various sputter-etched silicon substrates. The alloy films were produced by molecular beam epitaxy at various substrate temperatures (from 200°C to 400°C) and the magnetic properties of the films were examined by using vibrating sample magnetometry. We found out that the substrate surface roughness strongly affected the magnetic properties of alloy films. Actually, some alloy films on rough surface substrate showed larger values of effective perpendicular anisotropy Keff, coercivity Hc, and the squareness factor Mr/Ms than the film on smooth surface substrate. The magnetic properties of the alloy film prepared at 350°C on 5 min-etched substrate were comparable to those of the epitaxial Co/Pt multi-layer film. The structure of the alloy films was characterized by Atomic Force Microscopy, X-ray diffraction, transmission electron microscope and X-ray photoelectron spectroscopy.
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