Abstract
This paper gives an update on the cooperative programs for semiconductor equipment development in Europe. The background and founding structure of the ESPRIT, and MEDEA programs are explained. Recent projects in the field of micro lithography equipment such as the step and scan programs, the 193 nm technology program “ELLIPSE and programs to develop 300 mm wafer equipment are described briefly. In these joint projects Semiconductor Manufacturers, Equipment and Material Suppliers and Technical Institutes are participating. In some cases cooperations with non-European companies have been successfully implemented. This global cooperation is expected to increase in view of the increased costs of technology developments.
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