Abstract
We investigated the photoexcited carrier dynamics in Si by using optical pump and terahertz probe spectroscopy in an energy range between 2 and 25 meV. The formation dynamics of excitons from unbound $e$-$h$ pairs was studied through the emergence of the 1$s$-2$p$ transition of excitons at 12 meV (3 THz). We revealed the thermalization mechanism of the photoinjected hot carriers (electrons and holes) in the low-temperature lattice system by taking account of the interband and intraband scattering of carriers with acoustic and optical phonons. The overall cooling rate of electrons and holes was numerically calculated on the basis of a microscopic analysis of the phonon scattering processes, and the results well account for the experimentally observed carrier cooling dynamics. The long formation time of excitons in Si after the above-gap photoexcitation is reasonably accounted for by the thermalization process of photoexcited carriers.
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