Abstract
Titanium diboride has many interesting physical and chemical properties that make it attractive as a tribological coating material. We focus our study on the relationship between hardness, crystal structure and processing parameters for TiB2 thin films produced by conventional and ionized magnetron sputtering. When synthesized by conventional magnetron sputtering, TiB2 films with the highest degree of crystallinity have the highest hardness and are obtainable at an optimum combination of argon pressure and substrate bias. The films also show strong (0001) texture. Such high degree of crystallinity can be obtained without substrate bias by ionized magnetron sputtering, in which enhanced ionization of the plasma is obtained by inductively coupling RF power in the region between the magnetron target and the substrate.
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