Abstract
This study evaluates the effectiveness of vapour-phase deposition for creating sub-monolayer coverage of aminopropyl triethoxysilane (APTES) on silicon in order to exert control over subsequent gold nanoparticle deposition. Surface coverage was evaluated indirectly by observing the extent to which gold nanoparticles (AuNPs) deposited onto the modified silicon surface. By varying the distance of the silicon wafer from the APTES source and concentration of APTES in the evaporating media, control over subsequent gold nanoparticle deposition was achievable to an extent. Fine control over AuNP deposition (AuNPs/μm2) however, was best achieved by adjusting the ionic concentration of the AuNP-depositing solution. Furthermore it was demonstrated that although APTES was fully removed from the silicon surface following four hours incubation in water, the gold nanoparticle-amino surface complex was stable under the same conditions. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were used to study these affects.
Highlights
Fabrication and manipulation of nano-sized features is a fast-growing science playing an important role in the development of electronics, materials and biotechnology [1]
Some variability was noted in the data, in general, the AuNP number density was consistent between 0.25 and 2.0 cm from the aminopropyl triethoxysilane (APTES) source
Control over APTES surface concentration was achieved by varying the concentration in the evaporating medium, which was confirmed by X-ray photoelectron spectroscopy (XPS) analysis
Summary
Fabrication and manipulation of nano-sized features is a fast-growing science playing an important role in the development of electronics, materials and biotechnology [1]. Whilst conventional surface patterning methods, such as photolithography and microcontact printing, are restricted to surface patterning in the micrometer range, electron beam lithography can etch materials with line-widths as low as 5 nm [2] whilst scanning probe techniques are able to manipulate structures at the molecular and even atomic scale [3]. Whilst AFM techniques are able to pattern very small surface areas, gravure printing has been shown to be able to pattern much larger areas [7]. These “top-down” approaches often involve the use of hazardous chemicals, sophisticated equipment and are expensive. Simple molecular self-assembly, for example nanosphere lithography [8], is an alternative and accessible alternative to these approaches
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