Abstract
AbstractTo build nanotube based nanodevices, controlling the growth of aligned carbon nanotubes will be essential. Our group reported a method for growing aligned nanotube selectively on SiO2 surfaces by thermal chemical vapor deposition (CVD) method from xylene-metallocene mixtures. Here we will describe further studies on the roles of shape and thickness of patterned oxide structures for the controlled growth of aligned carbon nanotubes. By designing the shapes and the thickness of silicon oxide patterns with conventional micro fabrication techniques like lithography and dry & wet etching we could control the growth position as well as orientation of aligned carbon nanotubes precisely.
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