Abstract
Low stochastics, high sensitivity photoresists remain a goal for lithography. Here we present a study of a polymer system, polypeptoids, using a synthetic strategy borrowed from the biomedical community to make improvements to these resist characteristics through control of polymer sequence. We describe peptoid polymers that possess identical molecular size, composition and sequence with higher molecular uniformity than possible by conventional synthetic techniques. We report the results of exposure of these materials to DUV radiation and the chemical changes that occur. In addition, we highlight unexpected observations of the role of sequence on lithographic performance.
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