Abstract
We have developed a new procedure for efficient combing of DNA on a silicon substrate, which allows reproducible deposition and alignment of DNA molecules across lithographically defined patterns. The technique involves surface modification of Si/SiO2 substrates with a hydrophobic silane by using gas-phase deposition. Thereafter, DNA molecules are aligned by dragging the droplet on the hydrophobic substrate with a pipette tip. Using this procedure, DNA molecules were stretched to an average value of 122% of their contour length. Furthermore, we demonstrated combing of ca. 900 nm long stretches of genomic DNA across nanofabricated electrodes, which was not possible by using other available combing methods. Similar results were also obtained for DNA–peptide conjugates. We suggest this method as a simple yet reliable technique for depositing and aligning DNA and DNA derivatives across nanofabricated patterns.
Highlights
DNA is the subject of many investigations in different areas of nanotechnology research, ranging from genomic and biological studies [1,2] to the development of nanomachines and nanocircuits [3]
Deposition of DNA molecules across the electrodes is problematic in this case, even for relatively long DNA
It was possible to achieve 900 nm long stretches of dsDNA deposited across nanoelectrodes
Summary
DNA is the subject of many investigations in different areas of nanotechnology research, ranging from genomic and biological studies [1,2] to the development of nanomachines and nanocircuits [3]. Bensimon et al introduced a so-called molecular combing technique in 1994 as an effective way to achieve ordered alignments of DNA molecules stretched on a solid surface [4]. Several methods have been introduced that involved a combination of molecular combing with other techniques such as lithographic patterning [7].
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