Control of the preferential orientation and properties of HiPIMS and DCMS deposited chromium coating based on bias voltage

Abstract

This study investigates the effects of varying bias voltages on the crystallographic orientation and properties of DCMS + HiPIMS-deposited chromium coatings. Under bias voltages varying from 100 to 500 V, dense Cr coatings were obtained, and the deposition rate decreased by 13 %. The bias voltage significantly impacts the hardness, crystallographic orientation, electrical conductivity, and bonding strength of the coating. As the bias voltage increases, the hardness of the Cr coating gradually increases. The crystallographic orientation of the coating is governed collectively by surface energy, strain energy, and sputtering effects. The preferential crystallographic orientation of the Cr coating transitions from (222) to (110), subsequently changing to a mixed preferential crystallographic orientation of (110), (211), and (222). Under the combined influence of thermal effects and ion bombardment, a (110) preferential crystallographic orientation was obtained at a bias voltage of 300 V, featuring moderate hardness and optimal wear resistance. This study establishes that the electrical characteristics of the coatings have a significant correlation with bias voltage levels.