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Abstract
The surface of the photosensitive Diazo-Naphto-quinone/novolak film was chemically manipulated through UV exposure and subsequent thermal processes to obtain different surface functionalities (DNQ, carboxylic, imidazole, indene, silylated and charged groups) and hydrophobicities. The neuronal cell attachment is sensitive to chemical functionalization, with favourable influence from charged, imidazole and carboxylic groups, while the hydrophobic/hydrophilic balance of the photoresist surface plays at best a secondary role. The microlithographic techniques assessed (standard positive tone, negative and positive tone image reversal, and surface imaging based on silylation) can be used to gain insight into the cell attachment mechanisms. The positive tone DNQ/novolak/imidazole system was found to be a suitable candidate for cell patterning.
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