Abstract
The layer magnetization, the saturation magnetization as well as the magnetic anisotropy, and damping behavior of 20nm thick Ni81Fe19 films have been modified by 30keV Ni ion implantation with fluences up to 1×1016Ni∕cm2 (≈5at.%). With increasing ion fluence a magnetic dead layer of increasing thickness is formed which leads to a reduction of the total magnetization. In addition, the saturation magnetization of the residual ferromagnetic film decreases due to, both, a shift in stoichiometry and radiation damage. Accordingly a reduction of the magnetic anisotropy and a strong enhancement of the magnetic damping parameter are observed. Moreover, ion implantation in an applied magnetic field allows the setting of the uniaxial anisotropy direction irrespective of its original orientation. Static and dynamic magnetic properties of Ni81Fe19 films can be tailored over a wide range after film deposition.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
