Abstract
High purity nanoporous silica was fabricated using Shirasu volcanic ash as a starting material. The starting materials were placed into a platinum crucible and were melted at 1400°C. A mother glass was formed by quenching the melt in pure water. Leaching was performed by immersing the mother glass into an HCl solution. Nonsilica phases formed by phase separation in the mother glass were leached out with acid solution. The obtained porous silica was more than 99% pure and had pore size smaller than 2 nm. In order to control the pore size, post heat treatment was performed. The pore size could be controlled from 3.1 to 21.7 nm by changing the post treatment temperature.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
