Year-end Sale % OFF 
Abstract
Abstract Diamond is the most promising material for future applications in the fields of semiconductors and optics due to its extraordinary physical properties. The development of diamond processing technology, especially polishing, is of great importance for diamond applications. Diamond friction during polishing usually occurs at room temperature. In this paper, the material removal rate at low temperature (about the temperature of liquid nitrogen) is studied by using molecular dynamics (MD) simulation and designed experiments. This study reveals that the inhibitory effect of low temperature on diamond removal is an efficient way to control the diamond material removal rate in the nanoscale range and enables the control of material removal on an atomic scale in diamond polishing.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
