Abstract
Diamond films were prepared on a pure Ti substrate using the microwave plasma assisted chemical vapor deposition (MW-PACVD) method. The effects of applying two types of gas mixtures (H 2/CH 4 and Ar/H 2/CH 4) during diamond deposition on the microstructure of a Ti substrate were studied. With H 2/CH 4 (196:4) gas mixture, during diamond film deposition, hydrogen diffused into the Ti substrate and led to significant microstructure coarsening and a severe loss in Charpy impact energy. Post dehydrogenation annealing at a temperature of 800°C, could not change the coarse structure of the substrate, thus there was no improvement in Charpy impact energy. With the application of Ar/H 2/CH 4 (180:16:4) gas mixture, a smooth and nano-crystalline diamond film was deposited, and there was a minimum change in the substrate microstructure and Charpy impact energy after diamond deposition. The above results provide useful information for the successful application of diamond films (on a Ti substrate) for biomedical and aerospace application.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
