Control of La-doped Pb(Zr,Ti)O3 crystalline orientation and its influence on the properties of ferroelectric random access memory

Abstract

We investigated the crystallization mechanisms of sputter-deposited La-doped Pb(Zr,Ti)O3 (PLZT) on a Pt/Ti metal stack in the postdeposition annealing (PDA) at 600 °C in O2-mixed Ar ambient. As-deposited amorphous PLZT generally transforms to a perovskite phase over 550 °C through a metastable pyrochlore phase during the PDA. We found that the O2 content of the PDA ambient crucially affects the pyrochlore-perovskite transformation (PPT) speed. While an O2 content much higher than 2% of the PDA ambient suppresses PPT, an O2 content much lower than 2% enhances PPT. An O2 content around of 2% of the PDA suppresses PPT near the surface of PLZT and simultaneously keeps PPT fast in the inner regions of PLZT in the pyrochlore phase because of the O2 diffusion limit from the PLZT surface, eventually resulting in almost only the growth of highly {111} oriented columnar PLZT on Pt, which reveals better electric properties than those obtained by the PDA with the ambient of O2 contents much higher or lower than 2%.