Abstract

The possibility of higher electrical efficiency in computing by operating at low temperatures raises the need for non-volatile memory cells optimized for cryogenic operation. We report a study on low temperature spin transfer torque switching of magnetic tunnel junctions with 20 to 100 nm in diameter with thermal stability adapted to low temperature operation. The evolution of magnetic and electrical properties are characterized for four different stacks from 300 to 10 K comprising insertions of Mg, Ru and permalloy (Py) in the storage layer to reduce its effective anisotropy. Two figures of merit are used to compare different devices and stacks, Δ/Ic and Δ/Esw, normalizing the thermal stability Δ by the critical current or switching energy. Devices with a Py insertion layer show a higher FOM (3.78 kBTop/μA) and switching energy Esw below 655 fJ for 100 ns pulses at Top = 10 K. A procedure to optimize the reference layer stray field was also implemented to achieve full compensation using a synthetic antiferromagnetic layer for 20 nm diameter devices.

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