Abstract
ABSTRACTA selective nucleation based crystal-growth-technique over amorphous substrates is originated. The method manipulates nucleation sites and periods and hence, controls the grain boundary location by modifing the substrate surface. In Si, small Si3 N4 nucleation sites are formed, 1–2 pm in diameter, 100 μm in period, over Sio2. One Si nucleus is formed exclusively in the small area of Si3 N4 by CVD. The highly faceted and periodically located nuclei grow over SiO2 up to 100 μm in diameter before impingement. A MOS-FET fabricated inside the island operates comparably to the bulk Si control
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