Control of dipole properties in high-k and SiO2 stacks on Si substrates with tricolor superstructure

Abstract

The concept of the tricolor superstructure (TCS), which is a triple-layer stack structure containing two types of high dielectric constant (high-k) layers (designated HK1 and HK2) and a SiO2 layer, is proposed to control the moment and the polarity of the interface dipole layer that are induced at the high-k/SiO2 interfaces. The interface dipole layer is formed by oxygen ion migration from the layer with higher oxygen areal density (σ) to that with lower σ. When the two high-k materials are selected with the order of σHK1 > σSiO2 > σHK2 in a SiO2/HK2/HK1/SiO2 TCS, the dipole directions of the interface dipole layers at the SiO2/HK2 and the HK1/SiO2 interfaces are aligned. Additionally, in the transposed SiO2/HK1/HK2/SiO2 TCS, the total polarity is reversed. The concept is demonstrated using Al2O3 and Y2O3 layers because they offer the order of σAl2O3 > σSiO2 > σY2O3. The two stacking sequence samples composed of SiO2/Y2O3/Al2O3/SiO2 and SiO2/Al2O3/Y2O3/SiO2 that were fabricated using superlattice technique by pulsed laser deposition obviously show opposite dipole polarities. Increasing repetition of the deposited TCS unit also causes the dipole moments to increase systematically. The TCS technique enables control of the properties of the interface dipole layer at high-k/SiO2 interfaces in amorphous systems.