Abstract
The possibility of controlling the effective barrier height in Schottky diodes by introducing a δ-doped layer near the metal-semiconductor contact is considered. A decrease in the effective barrier height is caused by the increased role of carrier tunneling through the barrier. A complete quantum-mechanical numerical simulation of the effect of the δ-layer parameters (concentration and depth) on the current-voltage characteristics of modified diodes was carried out for the Schottky barrier contacts to n-GaAs. The simulation results were found to fit well the experimental characteristics of diodes produced by metal-organic chemical vapor epitaxy. The studies carried out made it possible to choose the optimal δ-layer parameters to produce low-barrier (about 0.2 eV) diodes with a reasonable nonideality factor (n≤1.5). Such structures can be employed to fabricate microwave detector diodes without bias.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
