Abstract
Self-assembly of colloidal particles for 'bottom-up' fabrication of various patterns and structures is critical for a range of applications including, but not limited to, energy generation and storage, nanomaterial structures, biomimetics, and biosensing. Multiple self-assembly techniques, such as substrate templating-via topological or chemical patterning-and solvent evaporation were discussed in our previous papers and have been developed for the deposition of patterned self-assembled structures, such as bands of colloidal particles, on various substrates. While the templating techniques are limited in applications due to the requirements for pattern-specific prior substrate engineering to fabricate the desired structure, solvent evaporation requires longer assembly times and precise control over environmental conditions. In this paper, a template-free, continuous flow process, which is facilitated by continuous solvent drainage through porous substrates, is demonstrated for the self-assembly of colloidal particles into high-aspect ratio (>103, length to width) structures, such as linear arrays or grid structures. Colloidal particles were assembled both on polymeric and metallic porous membranes, with rapid assembly times.
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