Abstract
The main purpose of the paper is to construct the four probes to calculate the sheet resistance the thin film. For the thin film this paper presents the experimental preparation of Tin dioxide thin films. A dual voltage power supply and constant current source is developed to study deeply for the constant current output. Electrical properties are measured using constant current source, sheet resistance, four probe), digital multimeter and micro ammeter. The effect of thickness of sheet resistance thin film is carried out by four probe method.
Highlights
Nano-crystals of semiconductor metal oxides have attracted a great interest due to their intriguing properties, which are different from those of their corresponding bulk state
The process was repeated for two more coatings making it 4-coated thin film of tin dioxide followed by annealing procedure
We have studied the constant current source, electrical characterization: sheet resistivity using spin coating technique
Summary
Nano-crystals of semiconductor metal oxides have attracted a great interest due to their intriguing properties, which are different from those of their corresponding bulk state. The research and development on thin film technology have been increasing rapidly over the past two decades due to their vast applications in almost all fields of science and technology It is utilized in many commercial applications such as anti- reflection coatings, liquid crystal displays, and piezoelectric, electro- and photo-luminescent devices, chemical and biological sensors. There are several methods for preparation of tin oxide thin films some of them are Spray pyrolysis, Deep coating, Solgel method, Spin coating method, Adsorption and reaction method, Chemical vapor deposition etc. Most of these deposition techniques are broadly divided into two categories: physical vapor deposition processes and chemical processes. Physical vapor deposition processes include Pulsed laser deposition, sputtering (magnetic and Radio Frequency, RF) while chemical processes are chemical deposition, sol gel and metal organic chemical vapor deposition and liquid phase etc [4]
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