Abstract
A soft X-ray emission spectroscopy (SXES) apparatus was constructed using a grating monochromator. The resolution was sufficient to show differences in valence electronic structures of Si compounds including pure Si crystal. A nondestructive analysis of a Ni/Si(111) specimen with heat treatment was carried out using either a clear difference in Si L2,3 SXES spectra of Ni silicide and Si single crystals or the fact that the soft X-ray production depth increases in a solid with increasing energy of a primary electron, Ep. The electronic and atomic structures of the surface and interface of specimens adopted were clarified with Ep varying between 1.5 and 10 keV.
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