Abstract
In large area coating by reactive sputtering the homogeneity of the growing films is often essential. This property tends to depend critically on the geometry of the process chamber, arrangement of the magnetrons and construction of the gas inlets. In order to identify new ways to improve sputter equipment, film homogeneity has to be thoroughly studied. Often optical methods can be used for this purpose. We demonstrate how optical measurements combined with a novel fit algorithm can be used to gain insight into the details of the reactive sputter process of tin doped indium oxide and open new ways for improvement of the sputter equipment.
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