Conformal reversal imprint lithography for polymer nanostructuring over large curved geometries

Abstract

Nanoimprinting of polymer surfaces is a way to functionalize surfaces by changing surface topography alone. The authors have demonstrated a method for the transfer of nanostructured coatings onto a curved polymer substrate by adapting reversal imprint lithography, an alternative to hot embossing nanoimprint lithography, which is best suited for flat planar surfaces and thermoplastics. The curved surface was made antireflective and hydrophobic without any chemical changes—solely by the addition of a nanostructured surface coating. In the future, this technique could be applied to a variety of materials and to surfaces with even more complex curvatures.