Abstract
In this study, perovskite thin films (PFs) were conformally deposited on 100 cm2 textured silicon substrates using a two-step vacuum process. The PFs were fabricated by converting thin films of a sputtered-PbO precursor using the chemical vapor deposition process. The conversion of PbO thin films into PFs was confirmed by X-ray diffractometry. The uniformity of reflectance and thickness was higher than 86% and 92%, respectively, on 100 cm2 textured substrate. We applied methylammonium vapor treatment for complete conversion without residual layer and the power conversion efficiency was 10.2% on a glass/FTO/TiO2/MAPbI3/Spiro-MeOTAD/Au structure.
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