Abstract

Several configurations for rf undulators energized at millimeter wavelengths and designed to produce coherent nanometer radiation from sub-GeV electron beams are analyzed and compared with one another. These configurations include a traveling-wave resonant ring, a standing wave resonator, and a resonator operating close to cutoff.

Highlights

  • A conventional undulator comprising a static magnetic field typically has a period of a few centimeters

  • For optimizing an rf undulator design based on a typical free-electron laser (FEL) user’s preference for a given optical wavelength s, with a fixed injection beam parameter, and overall length scaling as Lg, the first-order considerations lead to the approximate scaling law, K $ 5=41s=4; (10)

  • Methods to excite this type of cavity, spectral characteristics of optical radiation generated in this undulator, and influence of geometry errors on radiation quality will be described in a forthcoming publication

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Summary

INTRODUCTION

A conventional undulator comprising a static magnetic field typically has a period of a few centimeters. In order to produce free-electron laser (FEL) radiation at nm wavelengths, a 1–2 GeV electron beam is required It should have strong appeal for a nm-wavelength light source if, instead, a beam of several times less energy were required through use of an undulator with a period of under 1 cm. To have rf undulator magnetic fields as high as those produced by available permanent magnets or superconducting coils ($ 1 T) and corresponding K values close to unity, it would require GW-level propagating cm- or mm-wavelength rf power in a waveguide of $1 cm radius [9]. In rf undulators, beam dynamics issues that lead to emittance growth and associated distortions of the radiation spectrum must be investigated These issues arise because of peculiarities for rf undulators that are not found with static magnetic undulators. Detailed designs of these mentioned configurations will be described in a future paper

K PARAMETER FOR RF UNDULATORS
GENERAL PROPERTIES OF RF UNDULATORS
CONCLUSION
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