Configuration and Adjustment of Substrate Preheating Device

Abstract

Laser Metal Deposition Shaping (LMDS) is a state-of-the-art technology that combines rapid prototyping and laser processing. There are many factors affecting the quality, precision, microstructure and performance of LMDS-deposited parts. Among them, substrate preheating is a significant one since it can change the heat history of the LMDS process. Preheating is often used to reduce the residual stresses and the risk of thermal distortion and cracking. In this work a set of substrate preheating device for LMDS system employed with dual-channel control, namely intelligent PID temperature control and realtime serial-port temperature acquisition and feedback control, is designed and developed. In addition, the heating up rule gained through the relative experiment is introduced to reduce the overshoot amplitude of substrate preheating device by cascade control method. The results show that not only can this substrate preheating device realize the dual-channel control and continuous adjustment of substrate preheating temperature, but also can realtime collect and record the substrate temperature.