Abstract
Electrical conductivity of Au film deposited on Si(100), Si(111) and BK7 glass substrates, ranging from 20 nm to 1000 nm, was measured. Conductivity drop and a decrease of averaged crystallite size are observed around film thickness of 200 nm. Investigation of the conductivity drop led to the discovery that a redistribution of crystallites of {111} and {220} occurs in the conductivity drop region. By analyzing the relationship of distribution of crystallites, averaged crystallite size and conductivity ratios and together with the atomic force microscope pictures, leads to the conclusion that the thermal conductivity drop region is caused by the presence of many small crystallites. These small crystallites are responsible for yielding a lower averaged crystallite size and causing a higher grain boundary scattering.
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