Abstract
A new technique for depositing thin films has been investigated. The method consists in decomposing molecules on a substrate by bombarding them with electrons, leaving metal atoms on the substrate. The film is formed selectively on the area of the substrate struck by the electrons. Stannous chloride was decomposed to metallic tin by electrons of about 200 ev energy. Tetrabutyltin was also studied. With the current densities available, tetrabutyltin was only partially decomposed, to form a semiconducting polymer film. Theoretical considerations suggest that the method should be applicable to a wide variety of metals.
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