Computer simulation of crystal growth on a fcc surface

Abstract

Positive and negative crystal growth has been simulated on a (100) surface of a fcc crystal. The results show considerable similarities with the behavior of simple cubic surfaces, as far as the values of the interatomic bond energy and of the free energy for crystallization at which transition from smooth to rough surfaces occur. Growth rates are smaller, reflecting the formation of a sizable area where both deposition and removal of atoms is hindered. The surface roughness at equilibrium is similar to that obtained by computer simulation by other authors on a (100) surface of a Kossel crystal and it is close to that of a two-dimensional square lattice.